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Comparative Study on the Quality of Microcrystalline and Epitaxial Silicon Films Produced by PECVD Using Identical SiF4 Based Process Conditions

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https://hal.archives-ouvertes.fr/hal-03447659
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Submitted on : Wednesday, November 24, 2021 - 5:57:21 PM
Last modification on : Saturday, December 4, 2021 - 3:57:21 AM

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Mario Moreno, Arturo Ponce, Arturo Galindo, Eduardo Ortega, Alfredo Morales, et al.. Comparative Study on the Quality of Microcrystalline and Epitaxial Silicon Films Produced by PECVD Using Identical SiF4 Based Process Conditions. Materials, MDPI, 2021, 14 (22), pp.6947. ⟨10.3390/ma14226947⟩. ⟨hal-03447659⟩

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