Effects of substrate roughness on Van Der Waals and electrostatic force contributions to particle adhesion

Siddharth Rajupet (1) , Adriaan Riet (1) , Qizan Chen (1) , Mamadou Sow (2) , Daniel J. Lacks (1)

1 CWRU - Department of Chemical and Biomolecular Engineering , Case Western Reserve University
2 IRSN/PSN-RES/SCA/LPMA - Laboratoire de physique et de métrologie des aérosols

We characterize the effect of substrate roughness on van der Waals and electrostatic particle adhesion forces using theoretical methods. We find that substrate roughness can enhance or diminish electrostatic adhesion by at maximum a factor of ~2 for the surfaces studied, but can attenuate van der Waals forces by several orders of magnitude. Thus, substrate roughness can change the dominant contribution to adhesion from van der Waals forces to electrostatic forces.

Mots clés: particle adhesion roughness electrostatics van der Waals; particle adhesion; roughness; electrostatics; van der Waals

Domaines: Physique [physics]

Siddharth Rajupet, Adriaan Riet, Qizan Chen, Mamadou Sow, Daniel J. Lacks. Effects of substrate roughness on Van Der Waals and electrostatic force contributions to particle adhesion. CFA2021 - 34ème Congrès Français sur les Aérosols, Jan 2021, Paris, France. ⟨10.25576/ASFERA-CFA2021-24801⟩. ⟨irsn-03945368⟩