CH4 Etching B2 Semiconducting alloys Carbon Band gap Selenization CaTiO3Pr^3^+ Ablation laser Transfert d'énergie Sputtering Structure B3 Solar cells Applications industrielles Calcined clay 3 nm in size Spectroscopic ellipsometry A Thin films AuCu alloy Magnetron sputtering Colloidal solution Biocapteurs Carbon nitride Buffer Couple PECVD BOMBARDMENT CIGSe Band alignment Bixbyite Nanotubes Semiconductors B2 Quaternary Cathepsin A-CNx Titanium dioxide X-ray diffraction Physical vapor deposition C Photoelectron spectroscopy Capacitance Anatase Chalcogenides Vanadium Sesquioxide A1 Characterization Nanocomposite Amorphous Bipolar resistive switching BRS Resistive switching Residual stress Functionalization Thin films Chemical and biological sensors X-ray photoelectron spectroscopy A Multilayers B Chemical synthesis Copper Plasmas froids TiO2 V2O3 AZO thin films Atomic layer etching Low-pressure plasma processing XPS NEXAFS Ambipolar material Optical properties CHLORINE PLASMAS Non-volatile memory Oxides Amyloid precursor Adsorption Transmission electron microscopy Mott insulator Alzheimer's disease A Chalcogenides Chemical detection B2 Semiconducting indium compounds AlN Atomic force microscopy B1 Inorganic compounds Carbon nanotubes CNTs’ collapse Carbon Nanotube Avalanche breakdown SF 6 Biofilms microbiens A3 Physical vapor deposition processes Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Films Biomasse Thin film Plasma etching Scanning electron microscopy Chalcogenide glass Aryl-diazonium salts TEM Kirkendall effect Sol-gel Mott insulators Aluminium nitride Alloying Chalcogenide